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CVD Material Growth Engineer

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POST DATE 9/1/2016
END DATE 11/1/2016

MIT Lincoln Laboratory Lexington, MA

Lexington, MA
AJE Ref #
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Full Time
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The RF Technology Group develops and demonstrates innovative radio-frequency (RF) technologies and integrated subsystems as solutions to emerging national security needs in radar, electronic warfare, signals intelligence and communications. To execute its RF research and development mission, the group is vertically integrated and develops antennas, transmit/receive modules, multichannel wideband receiver-exciters, high-throughput digital processing architectures, beamformers, active and passive RF circuits, new semiconductor devices and associated epitaxial material with subsequent device processing. Novel RF solutions are developed at the material and device level up through the full RF subsystem level, with an emphasis on highly integrated, small-form-factor RF subsystems. The group collaboratively interacts with research groups across the Laboratory to take projects from initial concept stage, through simulation and analysis, to design and prototyping, and finally to field demonstration.

The RF Technology group seeks an Assistant Staff to assist in the development and support of epitaxial crystal growth of wide bandgap semiconductor materials for next generation RF devices. Responsibilities include working as part of team under the direction of a lead material scientist to support chemical vapor deposition (CVD) growth processes including substrate preparation, process optimization and post-growth metrology. It is expected that a qualified candidate will have experience with in-situ metrology techniques and familiarity with reactor design necessary to make modifications and upgrades as warranted. Candidate should have experience operating CVD equipment in a commercial manufacturing environment. Additionally, it is highly desirable that the candidate will have experience in building a complete CVD reactor from the ground up.

Candidates should hold a BS in Electrical Engineering, Applied Physics, or related field or have 10+ years of relevant work experience. Hands-on experience developing, operating, and maintaining CVD systems is a must and experience with CAD tools such as SolidWorks is a plus.

MIT Lincoln Laboratory is an Equal Employment Opportunity (EEO) employer. All qualified applicants will receive consideration for employment and will not be discriminated against on the basis of race, color, religion, sex, sexual orientation, gender identity, national origin, age, veteran status, disability status, or genetic information; U.S. citizenship is required.


Since 1951, when MIT Lincoln Laboratory was established to build the nation's first air defense system, the Laboratory has been applying advanced technology to solve problems critical to national security. Decade after decade, our people have envisioned incredible technology - and projects that start out as vital to national security often become just as vital to the everyday technology of the future. More than 700 patents have been granted for technologies developed by the Laboratory’s staff. And in the past two years, Lincoln Laboratory has been awarded eight R&D 100 Awards that recognize the year’s 100 most technologically significant innovations.

If you’d like to contribute to U.S. National security in an environment of incredible innovation, consider bringing your career to MIT Lincoln Laboratory.

As an Equal Opportunity Employer, we are committed to realizing our vision of diversity and inclusion in every aspect of our enterprise. Due to the unique nature

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